Imaging and Surface Analysis
Lieca Inspection Station – 5x, 10x, 20x, 50x, and 100x objectives, nomarski filters. High resolution camera for optical imaging.
Woolham VASE – Multi-spectral and multi-angle ellipsometry.
Wyko Dynamic Optical Profiler – Dynamic step height/deflection measurement using interferometry. Live deflection measurements also possible.
Prometrix SpectraMap – Non-contact measurement of thin films. Automated 40 plus measurements per wafer.
Tencor P2 Profilometer – Step height measurement and thin film stress calculations.
Nanometrics Spectrophotometer – Non-contact measurement of thin films. Manual set selection, wide range of measurable materials.
Zeiss Auriga SEM – Up to 20 KeV, two SEM detectors, one STEM detector, EDAX, and FIB. Substrates up to 150 mm will fit in chamber. Surface prep equipment also available including Au and Pt sputter sources.
NT-MDT AFM – Atomic Force Microscope with a one-centimeter stage capable of both AFM and STM.