SILICON BASED MEMBRANES

We specialize in developing and manufacturing silicon-based membranes.  We use proprietary etching methods, along with the latest in MEMS and thin-film processing, to fabricate freely suspended silicon membranes.  


Our silicon membranes are available through our standard products and through Custom Fabrication Services.  Please contact us to discuss your particular needs and applications.   

We offer a range of materials that suit many biomedical and material science applications.

NANOPOROUS

Nanoporous Silicon Nitride

  • Patent-pending, unique nanoporous membranes with scalable fabrication
  • 10 to 60 nm pore diameter with tunable pore distribution and porosity
  • 20 to 50 nm membrane thickness
  • < 10x10 µm to > 0.5x5 mm membrane area
  • See DesOrmeaux et al, Nanoscale 2014, for more details.

Nanoporous Silicon 

  • Patented, unique nanoporous membranes with scalable fabrication
  • 10 to 50 nm pore diameter with tunable pore distribution and porosity
  • 10 to 30 nm membrane thickness
  • < 10x10 µm to > 100x1500 µm membrane area
  • See Striemer et al, Nature 2007, for more details.

MICROPOROUS

Microporous G-FLAT™  Silicon Oxide

  • Patent-pending,  wrinkle-free membranes
  • 0.5 µ to > 10 µm diameter pores with specified porosity
  • 20 nm to > 1 µm membrane thickness
  • < 10x10 µm to > 2x2 mm membrane area

Microporous Silicon Nitride  

  • 0.5 µ to > 10 µm diameter pores with specified porosity
  • 20 nm to > 1 µm membrane thickness
  • < 10x10 µm to > 2x2 mm membrane area
  • Low-stress, non-stoichiometric by LPCVD

NON-POROUS

Silicon Nitride

  • 5 nm to > 1 µm membrane thickness
  • < 10x10 µm to 2x2 mm membrane area
  • Tunable stress and stoichiometry by LPCVD and PECVD

Silicon Oxide 

  • 20 nm to > 1 µm membrane thickness
  • < 10x10 µm to > 2x2 mm membrane area
  • Thermal, PECVD and RF magnetron sputter deposition

Pure Silicon 

  • 5 nm to > 500 nm membrane thickness
  • < 10x10 µm to > 2x2 mm membrane area
  • Amorphous by RF magnetron sputter deposition and poly-crystalline by PECVD
  • Also available: Single Crystal Pure Silicon

PATTERNED METAL MODIFICATIONS 

  • Features patterned with Au, Pt, Cr, Al, Rh, etc..
  • Micron-level feature resolution
  • Micron-level alignment to membranes
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SiMPore Inc.
150 Lucius Gordon Dr. Suite 110
West Henrietta, NY 14586 USA

Phone: +1 585 214 0585
Toll Free: 888 323 6266
Fax : 888 249 2935
E-mail: info@simpore.com